报告主题：碳化硅压阻效应的机理研究及数值计算方法

(Mechanism study and numerical calculation method of SiC piezoresistive effect)

报告时间：2023年9月7日（星期四）下午15:30~16:30

地点：新葡的京集团4321出版大厦六楼第二会议室

汇报人：吴晨

国内导师：蒋庄德教授

留学单位：日本东京大学

国外导师：Prof. Toshihiro Itoh

留学时间：2022.04~2023.07

Abstract: The China Scholarship Council (CSC) sponsors talented Chinese students for overseas study with the aim of improving the quality of postgraduate training and enhancing the development of China's higher education. Chen Wu was a visiting student in the Department of Precision Engineering, The University of Tokyo, under the supervision of Prof. Toshihiro Itoh, sponsored by the CSC.

This presentation provides a comprehensive report on Chen Wu’s research work, focusing on the systematic mechanism analysis and numerical calculation method of the silicon carbide piezoresistive effect. Additionally, the report provides an introduction of the Integrated Microsystem Packaging & Embedding into Human Environment group and offers insights into the life and cultural experiences of Japan. This study made contributions to the basic theoretical research of the third-generation wide-bandgap semiconductor silicon carbide, and laid the foundation for the design and manufacture of novel silicon carbide devices.

摘要：中国国家留学基金管理委员会（CSC）致力于资助优秀的中国留学生到海外进行学习，旨在提高研究生培养质量并促进中国高等教育的发展。自2022年4月至2023年7月，吴晨博士(在读)在CSC的资助下于日本东京大学精密工程系微系统实装研究室作为联合培养博士生开展学术交流，在Toshihiro Itoh教授的指导下从事研究工作。本汇报是吴晨博士联合培养期间科学研究和生活体验等方面的全面报告与总结，重点介绍碳化硅压阻效应的系统性机理分析及其数值计算方法。此外，报告还介绍了微系统实装研究室团队的研究成果，并将分享有关日本生活及文化体验的见解。本研究为第三代宽禁带半导体碳化硅的传感应用做出了基础理论研究贡献，为新型碳化硅器件设计制造奠定了基础。